Journal
/
/
Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
JoVE Journal
Engineering
A subscription to JoVE is required to view this content.  Sign in or start your free trial.
JoVE Journal Engineering
Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots

15,915 Views

15:47 min

November 01, 2013

DOI:

15:47 min
November 01, 2013

5 Views
, ,

Summary

Automatically generated

This paper presents a detailed fabrication protocol for gate-defined semiconductor lateral quantum dots on gallium arsenide heterostructures. These nanoscale devices are used to trap few electrons for use as quantum bits in quantum information processing or for other mesoscopic experiments such as coherent conductance measurements.

Read Article