Journal
/
/
Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
JoVE Journal
Engenharia
É necessária uma assinatura da JoVE para visualizar este conteúdo.  Faça login ou comece sua avaliação gratuita.
JoVE Journal Engenharia
Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots

15,918 Views

15:47 min

November 01, 2013

DOI:

15:47 min
November 01, 2013

5 Views
, ,

Summary

Automatically generated

This paper presents a detailed fabrication protocol for gate-defined semiconductor lateral quantum dots on gallium arsenide heterostructures. These nanoscale devices are used to trap few electrons for use as quantum bits in quantum information processing or for other mesoscopic experiments such as coherent conductance measurements.

Read Article