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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
JoVE Journal
Ingegneria
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JoVE Journal Ingegneria
Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
DOI:

15:47 min

November 01, 2013

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Capitoli

  • 00:05Titolo
  • 01:21Etching of the Mesa
  • 05:53Fabrication of the Ohmic Contacts
  • 08:38Fabrication of the Titanium/Gold Schottky Leads
  • 10:45Fabrication of the Aluminum Gates
  • 11:08Fabrication of the Bonding Pads
  • 11:54Dicing of the Sample
  • 12:50Bonding
  • 13:07Results: Confirming Gate Integrity
  • 15:14Conclusion

Summary

Traduzione automatica

This paper presents a detailed fabrication protocol for gate-defined semiconductor lateral quantum dots on gallium arsenide heterostructures. These nanoscale devices are used to trap few electrons for use as quantum bits in quantum information processing or for other mesoscopic experiments such as coherent conductance measurements.

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