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Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots
JoVE 杂志
工程学
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JoVE 杂志 工程学
Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots

Nanofabrication of Gate-defined GaAs/AlGaAs Lateral Quantum Dots

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15:47 min

November 01, 2013

DOI:

15:47 min
November 01, 2013

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Summary

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This paper presents a detailed fabrication protocol for gate-defined semiconductor lateral quantum dots on gallium arsenide heterostructures. These nanoscale devices are used to trap few electrons for use as quantum bits in quantum information processing or for other mesoscopic experiments such as coherent conductance measurements.

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