Journal
/
Engineering
/
Het gebruik van Offer Nanodeeltjes te verwijderen van de effecten van Shot-noise in contact Gaten vervaardigd door E-lithografie
JoVE Journal
Engineering
A subscription to JoVE is required to view this content.  Sign in or start your free trial.
JoVE Journal Engineering
Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
Please note that all translations are automatically generated. Click here for the English version.

Het gebruik van Offer Nanodeeltjes te verwijderen van de effecten van Shot-noise in contact Gaten vervaardigd door E-lithografie

Nederlands

Automatically Generated

7,098 Views

•

07:47 min

•

February 12, 2017

DOI:

10.3791/54551-v

DOI:
10.3791/54551-v

•

07:47 min
February 12, 2017

•

3 Views
,
1Department of Chemistry,Portland State University, 2Logic Technology Department,Intel Corporation

Explore More Videos

Sacrificial NanoparticlesShot-noiseE-beam LithographyContact HolesSub-20 Nanometer PatternsRCA CleaningAATMSPMMAGold NanoparticlesEvaporation

Read Article

Cite this Article

Rananavare, S. B., Morakinyo, M. K. Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography. J. Vis. Exp. (120), e54551, doi:10.3791/54551 (2017).

Download .ris file

Copy

Share Video

.

Copy