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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

7,127 Views

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07:47 min

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February 12, 2017

DOI:

10.3791/54551-v

DOI:
10.3791/54551-v

•

07:47 min
February 12, 2017

•

6 Views
,
1Department of Chemistry,Portland State University, 2Logic Technology Department,Intel Corporation

Summary

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Uniformly sized nanoparticles can remove fluctuations in contact hole dimensions patterned in poly(methyl methacrylate) (PMMA) photoresist films by electron beam (E-beam) lithography. The process involves electrostatic funneling to center and deposit nanoparticles in contact holes, followed by photoresist reflow and plasma- and wet-etching steps.

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Sacrificial NanoparticlesShot-noiseE-beam LithographyContact HolesSub-20 Nanometer PatternsRCA CleaningAATMSPMMAGold NanoparticlesEvaporation

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Cite this Article

Rananavare, S. B., Morakinyo, M. K. Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography. J. Vis. Exp. (120), e54551, doi:10.3791/54551 (2017).

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