Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Tyler L. Van Well; Matthew Redshaw; Nadeesha D. Gamage; R. M. Eranjan B. Kandegedara

doi:10.3791/54030

Journal

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공학

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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

9,321 Views

•

06:58 min

•

July 12, 2016

DOI:

10.3791/54030-v

DOI:

10.3791/54030-v

•

06:58 min

July 12, 2016

•

1 Views

Tyler L. Van Well¹, Matthew Redshaw¹, Nadeesha D. Gamage¹, R. M. Eranjan B. Kandegedara¹

¹Department of Physics,Central Michigan University

Summary

A method for electrochemically etching field emission tips is presented. Etching parameters are characterized and the operation of the tips in field emission mode is investigated.

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Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

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