Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Tyler L. Van Well; Matthew Redshaw; Nadeesha D. Gamage; R. M. Eranjan B. Kandegedara

doi:10.3791/54030

Journal

/

Engenharia

/

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

JoVE Journal
Engenharia

É necessária uma assinatura da JoVE para visualizar este conteúdo. Faça login ou comece sua avaliação gratuita.

JoVE Journal Engenharia

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

9,322 Views

•

06:58 min

•

July 12, 2016

DOI:

10.3791/54030-v

DOI:

10.3791/54030-v

•

06:58 min

July 12, 2016

•

1 Views

Tyler L. Van Well¹, Matthew Redshaw¹, Nadeesha D. Gamage¹, R. M. Eranjan B. Kandegedara¹

¹Department of Physics,Central Michigan University

Summary

A method for electrochemically etching field emission tips is presented. Etching parameters are characterized and the operation of the tips in field emission mode is investigated.

Explore More Videos

Electrochemical Etching Field Emission Points (FEPs)Tungsten Rods Electron Impact Ionization Mass Spectrometry Sodium Hydroxide Solution DC Power Supply Copper Cathode FEP Catcher Block

Read Article

Electrochemical Etching and Characterization of Sharp Field Emission Points for Electron Impact Ionization

Summary

Automatically generated

Explore More Videos