/
/
Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy
This content is Free Access.
7,304 Views
•
14:16 min
•
October 23, 2018
DOI:
Summary
Automatically generated
Attainment of high-quality Schottky contacts is imperative for achieving efficient gate modulation in heterostructure field effect transistors (HFETs). We present the fabrication methodology and characteristics of Schottky diodes on Zn-polar BeMgZnO/ZnO heterostructures with high-density two dimensional electron gas (2DEG), grown by plasma-assisted molecular beam epitaxy on GaN templates.
Explore More Videos
Schottky DiodesZn-polar BeMgZnO/ZnO HeterostructurePlasma-assisted Molecular Beam EpitaxyZinc OxideHeterojunction Field Effect TransistorsTwo-dimensional Electron GasHigh-frequencyHigh-power Field Effect TransistorsElectron SaturationSchottky Contact StabilitySolar Plant DetectorsChemical SensorsBiosensorsSapphire SubstrateMetal Organic CVDAluminum NitrideGallium Nitride
Read Article
Cite this Article
Ding, K., Avrutin, V., Izioumskaia, N., Ullah, M. B., Özgür, Ü., Morkoç, H. Fabrication of Schottky Diodes on Zn-polar BeMgZnO/ZnO Heterostructure Grown by Plasma-assisted Molecular Beam Epitaxy. J. Vis. Exp. (140), e58113, doi:10.3791/58113 (2018).
Copy