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可変バンド ギャップ ピンホール フリー メチル鉛ハライド ペロブスカイト薄膜の低圧蒸気支援ソリューション プロセス
1Joint Center for Artificial Photosynthesis, Chemical Sciences Division,Lawrence Berkeley National Laboratory, 2Electrical Engineering and Computer Sciences,University of California, Berkeley, 3Materials Science Division,Lawrence Berkeley National Laboratory, 4Institute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China, 5Department of Physics, Graduate School of Nanotechnology,University of Trieste, 6TASC Laboratory,IOM-CNR – Istituto Officina dei Materiali, 7Department of Chemistry,University of California, Berkeley, 8Materials Science and Engineering,University of California, Berkeley, 9Joint Center for Artificial Photosynthesis,Lawrence Berkeley National Laboratory
Capítulos
- 00:05Título
- 00:52Preparation of Methylammonium Halide
- 02:50Preparation of Methylammonium Lead Halide Thin Films
- 05:30Results: Formation of Tunable Band Gap Pinhole-free Methylammonium Lead Halide Perovskite Films
- 07:12Conclusion
