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Dampf-gestützte Lösung Niederdruckverfahren für durchstimmbare Band Gap Pinhole-frei Methylammonium Blei Halogenid Perowskit Filme
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08:12 min
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September 08, 2017
DOI:
1Joint Center for Artificial Photosynthesis, Chemical Sciences Division,Lawrence Berkeley National Laboratory, 2Electrical Engineering and Computer Sciences,University of California, Berkeley, 3Materials Science Division,Lawrence Berkeley National Laboratory, 4Institute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China, 5Department of Physics, Graduate School of Nanotechnology,University of Trieste, 6TASC Laboratory,IOM-CNR – Istituto Officina dei Materiali, 7Department of Chemistry,University of California, Berkeley, 8Materials Science and Engineering,University of California, Berkeley, 9Joint Center for Artificial Photosynthesis,Lawrence Berkeley National Laboratory
Summary
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Hier präsentieren wir ein Protokoll für die Synthese von CH3NH3, I und CH3NH3Br Vorstufen und die anschließende Bildung Pinhole-frei, kontinuierliche CH3NH3PbI3 XBrx dünner Schichten für die Einsatz in hocheffizienten Solarzellen und anderen optoelektronischen Geräten.
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Cite this Article
Sutter-Fella, C. M., Li, Y., Cefarin, N., Buckley, A., Ngo, Q. P., Javey, A., Sharp, I. D., Toma, F. M. Low Pressure Vapor-assisted Solution Process for Tunable Band Gap Pinhole-free Methylammonium Lead Halide Perovskite Films. J. Vis. Exp. (127), e55404, doi:10.3791/55404 (2017).
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