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Omfattende karakterisering af Extended Fejl i Semiconductor Materials af en Scanning Electron Microscope
JoVE 신문
공학
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JoVE 신문 공학
Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
DOI:

11:14 min

May 28, 2016

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Chapters

  • 00:05Title
  • 01:16Sample Preparation for Cryo-cathodoluminescence Experiment
  • 02:06Cryo-cathodoluminescence Experiment
  • 06:28Performing Cross-correlation Electron Backscatter Diffraction Experiments
  • 08:50Results: Cathodoluminenscence and Strain Fields of Extended Defects in Silicon
  • 10:19Conclusion

Summary

자동 번역

The optical, electrical, and structural properties of dislocations and of grain boundaries in semiconductor materials can be determined by experiments performed in a scanning electron microscope. Electron microscopy has been used to investigate cathodoluminescence, electron beam induced current, and diffraction of backscattered electrons.

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