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Umfassende Charakterisierung von ausgedehnten Defekten in Halbleitermaterialien durch ein Rasterelektronenmikroskop
JoVE 신문
공학
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JoVE 신문 공학
Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope

Umfassende Charakterisierung von ausgedehnten Defekten in Halbleitermaterialien durch ein Rasterelektronenmikroskop

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11:14 min

May 28, 2016

DOI:

11:14 min
May 28, 2016

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Summary

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The optical, electrical, and structural properties of dislocations and of grain boundaries in semiconductor materials can be determined by experiments performed in a scanning electron microscope. Electron microscopy has been used to investigate cathodoluminescence, electron beam induced current, and diffraction of backscattered electrons.

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