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Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
JoVE Journal
工学
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JoVE Journal 工学
Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope

Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope

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11:14 min

May 28, 2016

DOI:

11:14 min
May 28, 2016

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概要

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The optical, electrical, and structural properties of dislocations and of grain boundaries in semiconductor materials can be determined by experiments performed in a scanning electron microscope. Electron microscopy has been used to investigate cathodoluminescence, electron beam induced current, and diffraction of backscattered electrons.

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