Journal
/
공학
/
Optik Doyurulabilen Geçişler aracılığıyla Desenlendirme - İmalat ve Karakterizasyonu
JoVE 신문
공학
JoVE 비디오를 활용하시려면 도서관을 통한 기관 구독이 필요합니다.  전체 비디오를 보시려면 로그인하거나 무료 트라이얼을 시작하세요.
JoVE 신문 공학
Patterning via Optical Saturable Transitions – Fabrication and Characterization
Please note that all translations are automatically generated. Click here for the English version.

Optik Doyurulabilen Geçişler aracılığıyla Desenlendirme - İmalat ve Karakterizasyonu

6,696 Views

•

08:19 min

•

December 11, 2014

DOI:

10.3791/52449-v

DOI:
10.3791/52449-v

•

08:19 min
December 11, 2014

•

2 Views
, ,
1Department of Electrical and Computer Engineering,The University of Utah, 2Department of Chemistry,The University of Wisconsin-Madison

Summary

Automatically generated

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

Explore More Videos

Optical Saturable TransitionsNanolithographyNanopatterningPhotochromic MoleculesTwo-photon PolymerizationBeam Pen LithographyScanning Electron Beam LithographyFocused Ion Beam PatterningParallel Near-field Optical Lithography

Read Article

Cite this Article

Cantu, P., Andrew, T. L., Menon, R. Patterning via Optical Saturable Transitions - Fabrication and Characterization. J. Vis. Exp. (94), e52449, doi:10.3791/52449 (2014).

Download .ris file

Copy

Share Video

.

Copy