Dergi
/
Mühendislik
/
Patterning via Optical Saturable Transitions – Fabrication and Characterization
JoVE Journal
Mühendislik
Bu içeriği görüntülemek için JoVE aboneliği gereklidir.  Oturum açın veya ücretsiz deneme sürümünü başlatın.
JoVE Journal Mühendislik
Patterning via Optical Saturable Transitions – Fabrication and Characterization

Patterning via Optical Saturable Transitions – Fabrication and Characterization

6,696 Views

•

08:19 min

•

December 11, 2014

DOI:

10.3791/52449-v

DOI:
10.3791/52449-v

•

08:19 min
December 11, 2014

•

2 Views
, ,
1Elektrik ve Bilgisayar Mühendisliği Bölümü,The University of Utah, 2Kimya Bölümü,The University of Wisconsin-Madison

Özet

Automatically generated

We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

Explore More Videos

Optical Saturable TransitionsNanolithographyNanopatterningPhotochromic MoleculesTwo-photon PolymerizationBeam Pen LithographyScanning Electron Beam LithographyFocused Ion Beam PatterningParallel Near-field Optical Lithography

Read Article

Cite this Article

Cantu, P., Andrew, T. L., Menon, R. Patterning via Optical Saturable Transitions - Fabrication and Characterization. J. Vis. Exp. (94), e52449, doi:10.3791/52449 (2014).

Download .ris file

Copy

Share Video

.

Copy