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Patterning via Optical Saturable Transitions – Fabrication and Characterization
JoVE Journal
Mühendislik
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JoVE Journal Mühendislik
Patterning via Optical Saturable Transitions – Fabrication and Characterization

Patterning via Optical Saturable Transitions – Fabrication and Characterization

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08:19 min

December 11, 2014

DOI:

08:19 min
December 11, 2014

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Özet

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We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

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