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Patterning via Optical Saturable Transitions – Fabrication and Characterization
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Patterning via Optical Saturable Transitions – Fabrication and Characterization

Patterning via Optical Saturable Transitions – Fabrication and Characterization

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08:19 min

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December 11, 2014

DOI:

10.3791/52449-v

DOI:
10.3791/52449-v

•

08:19 min
December 11, 2014

•

2 Views
, ,
1電気・コンピュータ工学科,The University of Utah, 2化学科,The University of Wisconsin-Madison

概要

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We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

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Cite this Article

Cantu, P., Andrew, T. L., Menon, R. Patterning via Optical Saturable Transitions - Fabrication and Characterization. J. Vis. Exp. (94), e52449, doi:10.3791/52449 (2014).

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