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광학 가포 전환을 통해 패터닝 - 제조 및 특성
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JoVE 신문 공학
Patterning via Optical Saturable Transitions – Fabrication and Characterization

광학 가포 전환을 통해 패터닝 - 제조 및 특성

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08:19 min

December 11, 2014

DOI:

08:19 min
December 11, 2014

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Summary

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We report that the diffraction limit of conventional optical lithography can be overcome by exploiting the transitions of organic photochromic derivatives induced by their photoisomerization at low light intensities.1-3 This paper outlines our fabrication technique and two locking mechanisms, namely: dissolution of one photoisomer and electrochemical oxidation.

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