/
/
Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
È necessario avere un abbonamento a JoVE per visualizzare questo. Accedi o inizia la tua prova gratuita.
Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers
3,736 Views
•
09:18 min
•
February 08, 2022
DOI:
Summary
Automatically generated
A protocol for metal-assisted chemical imprinting of 3D microscale features with sub-20 nm shape accuracy into solid and porous silicon wafers is presented.
Explore More Videos
Metal-assisted Electrochemical NanoimprintingPorous SiliconSolid SiliconHierarchical MicrostructuresMetasurface-based Microoptic ElementsWaveguide TechnologiesOptical BiosensorsInfrared Optical DevicesIII-V SemiconductorsStamp To Substrate Tip And Tilt AlignmentRCA-1 SolutionPFOCSPDMSUV Nanoimprinting
Read Article
Cite this Article
Sharstniou, A., Niauzorau, S., Junghare, A., Azeredo, B. P. Metal-Assisted Electrochemical Nanoimprinting of Porous and Solid Silicon Wafers. J. Vis. Exp. (180), e61040, doi:10.3791/61040 (2022).
Copy