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光增强氢氟酸钝化：一个敏感的技术检测散装硅缺陷
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Ingegneria
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JoVE Journal Ingegneria
Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects
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光增强氢氟酸钝化：一个敏感的技术检测散装硅缺陷

9,157 Views

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09:15 min

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January 04, 2016

DOI:

10.3791/53614-v

DOI:
10.3791/53614-v

•

09:15 min
January 04, 2016

•

1 Views
1Research School of Engineering,Australian National University

Summary

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一个RT液体表面钝化技术研究体硅缺陷的重组活性描述。对于该技术是成功的，三个关键的步骤是必需的：（ⅰ）化学清洗和硅的蚀刻，硅的（ⅱ）浸没在15％的氢氟酸和（iii）照明1分钟。

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Cite this Article

Grant, N. E. Light Enhanced Hydrofluoric Acid Passivation: A Sensitive Technique for Detecting Bulk Silicon Defects. J. Vis. Exp. (107), e53614, doi:10.3791/53614 (2016).

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