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硅上显性纳米结构α石英薄膜:从材料到新设备
JoVE Journal
Engineering
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JoVE Journal
Engineering
Epitaxial Nanostructured α-Quartz Films on Silicon: From the Material to New Devices
Please note that all translations are automatically generated.
Click here for the English version.
硅上显性纳米结构α石英薄膜:从材料到新设备
DOI:
10.3791/61766-v
•
11:34 min
•
October 06, 2020
•
Claire Jolly
,
David Sanchez-Fuentes
,
Ricardo Garcia-Bermejo
,
Dilek Cakiroglu
,
Adrian Carretero-Genevrier
1
Institut d’Electronique et des Systemes (IES), CNRS
,
Université de Montpellier
Chapters
00:05
Introduction
00:54
Preparation of PDMS Templates and Gel Film Deposition on SOI Substrates by Dip-Coating
02:55
Surface Micro/Nanostructuration by Soft Imprint Lithography and Gel Film Crystallization by Thermal Treatment
04:00
Preparing and Patterning of the Quartz Samples for the Cantilever Microfabrication Process
08:49
Results: Qualitative Analysis of the Progressive Epitaxial Nanostructured α-Quartz Film Thickness Developed on Silicon
10:20
Conclusion
Summary
Automatic Translation
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Automatic Translation
本工作为纳米结构α石英悬臂在绝缘硅(SOI)技术基板上的微压造提供了详细的协议,从石英薄膜的表观生长开始,采用浸涂法,然后通过纳米印花石刻技术对薄膜进行纳米结构处理。
Tags
Epitaxial
Nanostructured
Alpha-quartz
Silicon
Quartz-based Sensors
Miniaturization
Monolithic Integration
Chemical Integration
Epitaxial Requirements
Microcantilevers
Active Microelectromechanical System
Lead-free Piezoelectric Oxide Materials
Mass Sensitivity
PDMS
SOI Substrate
Dip Coating
Gel Film
Micro/nanostructure
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