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Nioboxid-Filme, die durch reaktives Sputtern abgelagert werden: Wirkung des Sauerstoffdurchflusses
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Chemistry
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JoVE Journal Chemistry
Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate
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Nioboxid-Filme, die durch reaktives Sputtern abgelagert werden: Wirkung des Sauerstoffdurchflusses

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7,093 Views

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08:23 min

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September 28, 2019

DOI:

10.3791/59929-v

DOI:
10.3791/59929-v

•

08:23 min
September 28, 2019

•

8 Views
, , , , ,
1Chemistry Department,Federal University of São Carlos (UFSCAR), 2Physics Department, School of Sciences,São Paulo State University (UNESP)

Summary

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Hier stellen wir ein Protokoll zur Nioboxid-Filmabscheidung durch reaktives Sputtern mit unterschiedlichen Sauerstoffdurchflussraten zur Verwendung als Elektronentransportschicht in Perowskit-Solarzellen vor.

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Cite this Article

Fernandes, S. L., Affonço, L. J., Junior, R. A. R., da Silva, J. H. D., Longo, E., Graeff, C. F. d. O. Niobium Oxide Films Deposited by Reactive Sputtering: Effect of Oxygen Flow Rate. J. Vis. Exp. (151), e59929, doi:10.3791/59929 (2019).

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