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Síntese e Caracterização de alta c-eixo ZnO Thin Film por Plasma aprimorado Chemical Vapor Deposition Sistema e sua Aplicação Photodetector UV
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Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application

Síntese e Caracterização de alta c-eixo ZnO Thin Film por Plasma aprimorado Chemical Vapor Deposition Sistema e sua Aplicação Photodetector UV

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08:18 min

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October 03, 2015

DOI:

10.3791/53097-v

DOI:
10.3791/53097-v

•

08:18 min
October 03, 2015

•

3 Views
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1Institute of Manufacturing Technology and Department of Mechanical Engineering,National Taipei University of Technology (TAIPEI TECH)

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Chao, C., Wei, D. Synthesis and Characterization of High c-axis ZnO Thin Film by Plasma Enhanced Chemical Vapor Deposition System and its UV Photodetector Application. J. Vis. Exp. (104), e53097, doi:10.3791/53097 (2015).

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