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Användning av offerNanoPartiklar att ta bort effekterna av Shot-brus i kontakt Hål tillverkas genom elektronstrålelitografi
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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Användning av offerNanoPartiklar att ta bort effekterna av Shot-brus i kontakt Hål tillverkas genom elektronstrålelitografi

7,089 Views

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07:47 min

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February 12, 2017

DOI:

10.3791/54551-v

DOI:
10.3791/54551-v

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07:47 min
February 12, 2017

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3 Views
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1Department of Chemistry,Portland State University, 2Logic Technology Department,Intel Corporation

Tags

Sacrificial NanoparticlesShot-noiseE-beam LithographyContact HolesSub-20 Nanometer PatternsRCA CleaningAATMSPMMAGold NanoparticlesEvaporation

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Rananavare, S. B., Morakinyo, M. K. Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography. J. Vis. Exp. (120), e54551, doi:10.3791/54551 (2017).

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