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L'utilizzo di nanoparticelle sacrificali per eliminare gli effetti del colpo-rumore in fori di contatto fabbricato da E-litografia a fascio
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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
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L'utilizzo di nanoparticelle sacrificali per eliminare gli effetti del colpo-rumore in fori di contatto fabbricato da E-litografia a fascio

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07:47 min

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February 12, 2017

DOI:

10.3791/54551-v

DOI:
10.3791/54551-v

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07:47 min
February 12, 2017

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3 Views
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1Department of Chemistry,Portland State University, 2Logic Technology Department,Intel Corporation

Tags

Sacrificial NanoparticlesShot-noiseE-beam LithographyContact HolesSub-20 Nanometer PatternsRCA CleaningAATMSPMMAGold NanoparticlesEvaporation

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Cite this Article

Rananavare, S. B., Morakinyo, M. K. Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography. J. Vis. Exp. (120), e54551, doi:10.3791/54551 (2017).

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