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Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
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Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
Capítulos
- 00:05Título
- 01:05Cutting Operation in MPL: Overview and Initial Steps
- 01:57Cutting Operation in MPL: Single-layer Microstructures on a Substrate
- 02:36Cutting Operation in MPL: Multi-layer Microstructures on a Substrate
- 04:44Drawing Operation in MPL: Making PDMS Micropillars on HDPE Channel Sidewalls
- 06:25Microstructures Formed by Cutting and Drawing, and Their Application
- 09:00Conclusion
A micropunching lithography approach is developed to generate micro- and submicron-patterns on top, sidewall and bottom surfaces of polymer substrates. It overcomes the obstacles of patterning conducting polymers and generating sidewall patterns. This method allows rapid fabrication of multiple features and is free of aggressive chemistry.
Tags
Micropunching LithographyGenerating Micro- And Submicron-patternsPolymer SubstratesConducting PolymersLithographic TechniquesTechnical ChallengesPhotolithographic MethodsWet EtchingDry EtchingMicro/nanosystemsPlanar FormSidewall Patterns3-D CircuitsFluidic ChannelsHorizontal Growth Of Nanowires And NanotubesMacropunching Method
