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Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates
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July 02, 2012
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A micropunching lithography approach is developed to generate micro- and submicron-patterns on top, sidewall and bottom surfaces of polymer substrates. It overcomes the obstacles of patterning conducting polymers and generating sidewall patterns. This method allows rapid fabrication of multiple features and is free of aggressive chemistry.
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Chakraborty, A., Liu, X., Luo, C. Micropunching Lithography for Generating Micro- and Submicron-patterns on Polymer Substrates. J. Vis. Exp. (65), e3725, doi:10.3791/3725 (2012).
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