This content is Free Access.
U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen
7,655 Views
•
12:05 min
•
February 21, 2019
DOI:
Read Article
Cite this Article
Gouder, T., Huber, F., Eloirdi, R., Caciuffo, R. U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen. J. Vis. Exp. (144), e59017, doi:10.3791/59017 (2019).
Copy