U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

Thomas Gouder; Frank Huber; Rachel Eloirdi; Roberto Caciuffo

doi:10.3791/59017

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U₂O₅ Film Preparation via UO₂Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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U₂O₅ Film Preparation via UO₂Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

7,735 Views

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12:05 min

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February 21, 2019

DOI:

10.3791/59017-v

DOI:

10.3791/59017-v

•

12:05 min

February 21, 2019

•

1 Views

Thomas Gouder¹, Frank Huber¹, Rachel Eloirdi¹, Roberto Caciuffo¹

¹European Commission, Joint Research Centre,Directorate for Nuclear Safety and Security

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This protocol presents the preparation of U₂O₅ thin films obtained in situ under ultra-high vacuum. The process involves oxidation and reduction of UO₂ films with atomic oxygen and atomic hydrogen, respectively.

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U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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U₂O₅ Film Preparation via UO₂Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen