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Fabricage van Gate-afstembare Grafeen Inrichtingen voor Scanning Tunneling Microscopy Studies met Coulomb Verontreinigingen
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JoVE 신문 공학
Fabrication of Gate-tunable Graphene Devices for Scanning Tunneling Microscopy Studies with Coulomb Impurities
DOI:

11:42 min

July 24, 2015

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Chapters

  • 00:05Title
  • 02:28Chemical Vapor Deposition of Graphene on a Cu Foil
  • 04:28Poly(methyl methacrylate) Transfer of Graphene onto Hexagonal Boron Nitride / Silicon Dioxide Chip
  • 06:29STM Tip Calibration on Au(111) Surface
  • 08:30Scanning Graphene
  • 09:40Results: STM Topography Reveals Coulomb Impurities on Graphene
  • 10:44Conclusion

Summary

자동 번역

This paper details the fabrication process of a gate-tunable graphene device, decorated with Coulomb impurities for scanning tunneling microscopy studies. Mapping the spatially dependent electronic structure of graphene in the presence of charged impurities unveils the unique behavior of its relativistic charge carriers in response to a local Coulomb potential.

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