Rivista
/
Ingegneria
/
Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography
JoVE Journal
Ingegneria
È necessario avere un abbonamento a JoVE per visualizzare questo.  Accedi o inizia la tua prova gratuita.
JoVE Journal Ingegneria
Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

7,089 Views

•

07:47 min

•

February 12, 2017

DOI:

10.3791/54551-v

DOI:
10.3791/54551-v

•

07:47 min
February 12, 2017

•

3 Views
,
1Department of Chemistry,Portland State University, 2Logic Technology Department,Intel Corporation

Tags

Sacrificial NanoparticlesShot-noiseE-beam LithographyContact HolesSub-20 Nanometer PatternsRCA CleaningAATMSPMMAGold NanoparticlesEvaporation

Read Article

Cite this Article

Rananavare, S. B., Morakinyo, M. K. Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography. J. Vis. Exp. (120), e54551, doi:10.3791/54551 (2017).

Download .ris file

Copy

Share Video

.

Copy