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Lavtryk damp-assisteret løsningsprocessen for afstemmelige Band Gap Pinhole-fri Methylammonium bly Halogenid Perovskite film
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September 08, 2017
DOI:
1Joint Center for Artificial Photosynthesis, Chemical Sciences Division,Lawrence Berkeley National Laboratory, 2Electrical Engineering and Computer Sciences,University of California, Berkeley, 3Materials Science Division,Lawrence Berkeley National Laboratory, 4Institute of Fundamental and Frontier Sciences,University of Electronic Science and Technology of China, 5Department of Physics, Graduate School of Nanotechnology,University of Trieste, 6TASC Laboratory,IOM-CNR – Istituto Officina dei Materiali, 7Department of Chemistry,University of California, Berkeley, 8Materials Science and Engineering,University of California, Berkeley, 9Joint Center for Artificial Photosynthesis,Lawrence Berkeley National Laboratory
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Sutter-Fella, C. M., Li, Y., Cefarin, N., Buckley, A., Ngo, Q. P., Javey, A., Sharp, I. D., Toma, F. M. Low Pressure Vapor-assisted Solution Process for Tunable Band Gap Pinhole-free Methylammonium Lead Halide Perovskite Films. J. Vis. Exp. (127), e55404, doi:10.3791/55404 (2017).
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