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Chemistry
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通过生长和退火过程中的氧空位控制来调整氧化物性能
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Chemistry
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JoVE Journal
Chemistry
Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing
Please note that all translations are automatically generated.
Click here for the English version.
通过生长和退火过程中的氧空位控制来调整氧化物性能
DOI:
10.3791/58737-v
•
06:44 min
•
June 09, 2023
•
Tristan Steegemans*
1
,
Shinhee Yun*
1
,
Carlos N. Lobato
,
Eric Brand
,
Yunzhong Chen
,
Felix Trier
,
Dennis V. Christensen
1
Department of Energy Conversion and Storage
,
Technical University of Denmark
,
2
Beijing National Laboratory for Condensed Matter Physics and Institute of Physics
,
Chinese Academy of Sciences
Chapters
00:05
Introduction
00:48
Controlling Properties by Varying Growth Conditions
03:26
Controlling Properties by Thermal Annealing
04:23
Results: Electronic Properties of SrTiO
3
-Based Heterostructures Tuned by Growth Modifications and Annealing
06:13
Conclusion
Summary
Automatic Translation
English (Original)
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Automatic Translation
氧化物材料显示出许多奇特的特性,可以通过调节氧含量来控制。在这里,我们演示了通过改变脉冲激光沉积参数和执行后退火来调整氧化物中的氧含量。例如,SrTiO
3
基异质结构的电子性能通过生长修饰和退火来调节。
Tags
Oxygen Vacancy
Oxide Thin Films
Defect Engineering
Strontium Titanate
Substrate Cleaning
Surface Termination
Thin Film Deposition
Gamma Alumina
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