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Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing
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Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing

Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing

2,747 Views

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06:44 min

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June 09, 2023

DOI:

10.3791/58737-v

DOI:
10.3791/58737-v

•

06:44 min
June 09, 2023

•

3 Views
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1Department of Energy Conversion and Storage,Technical University of Denmark, 2Beijing National Laboratory for Condensed Matter Physics and Institute of Physics,Chinese Academy of Sciences

Tags

Oxygen VacancyOxide Thin FilmsDefect EngineeringStrontium TitanateSubstrate CleaningSurface TerminationThin Film DepositionGamma Alumina

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Steegemans, T., Yun, S., Lobato, C. N., Brand, E., Chen, Y., Trier, F., Christensen, D. V. Tuning Oxide Properties by Oxygen Vacancy Control During Growth and Annealing. J. Vis. Exp. (196), e58737, doi:10.3791/58737 (2023).

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