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Funcionalización suaves litográfica y Patrones libre de óxido de silicio y el germanio
JoVE Journal
Bioengineering
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JoVE Journal Bioengineering
Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium
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Funcionalización suaves litográfica y Patrones libre de óxido de silicio y el germanio

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14,393 Views

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12:38 min

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December 16, 2011

DOI:

10.3791/3478-v

DOI:
10.3791/3478-v

•

12:38 min
December 16, 2011

•

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, , ,
1Department of Chemistry,Duke University , 2Hajim School of Engineering and Applied Sciences,University of Rochester , 3Department of Chemical Engineering,University of Rochester

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Bowers, C. M., Toone, E. J., Clark, R. L., Shestopalov, A. A. Soft Lithographic Functionalization and Patterning Oxide-free Silicon and Germanium. J. Vis. Exp. (58), e3478, doi:10.3791/3478 (2011).

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