Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

I-Ning Lee; Joseph Hosford; Shuai Wang; John A. Hunt; Judith M. Curran; William P. Heath; Lu Shin Wong

doi:10.3791/56967

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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

JoVE Journal
生物工学

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JoVE Journal 生物工学

Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

9,358 Views

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09:45 min

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June 12, 2018

DOI:

10.3791/56967-v

DOI:

10.3791/56967-v

•

09:45 min

June 12, 2018

•

2 Views

I-Ning Lee*^1,2, Joseph Hosford*¹, Shuai Wang³, John A. Hunt⁴, Judith M. Curran², William P. Heath³, Lu Shin Wong¹

¹Manchester Institute of Biotechnology & School of Chemistry,University of Manchester, ²School of Engineering,University of Liverpool, ³School of Electrical and Electronic Engineering,University of Manchester, ⁴School of Science and Technology,Nottingham Trent University

概要

Here we present a protocol for wide-area scanning probe nanolithography enabled by the iterative alignment of probe arrays, as well as the utilization of lithographic patterns for cell-surface interaction studies.

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Large-area Scanning Probe Nanolithography Facilitated by Automated Alignment and Its Application to Substrate Fabrication for Cell Culture Studies

概要

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