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在光刻技术定义的聚对二甲苯-C细胞图案：二氧化硅<sub> 2</sub>基板
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07:19 min
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March 07, 2014
DOI:
1Centre for Integrative Physiology, School of Biomedical Sciences,The University of Edinburgh, 2Edinburgh Cancer Research Centre, Institute of Genetics and Molecular Medicine,Western General Hospital, 3School of Engineering, Institute for Integrated Micro and Nano Systems,The University of Edinburgh
概要
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本协议描述了一个微加工兼容的方法在SiO 2细胞图案。预定义聚对二甲苯-C设计光刻印刷在SiO 2晶片。温育后用血清（或其它活化溶液）细胞粘附具体地（和根据的符合性生长）相关的聚对二甲苯-C，而被排斥由SiO 2区。
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Cite this Article
Hughes, M. A., Brennan, P. M., Bunting, A. S., Shipston, M. J., Murray, A. F. Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates. J. Vis. Exp. (85), e50929, doi:10.3791/50929 (2014).
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