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Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates
JoVE 杂志
生物工程
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JoVE 杂志 生物工程
Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates

Cell Patterning on Photolithographically Defined Parylene-C: SiO2 Substrates

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07:19 min

March 07, 2014

DOI:

07:19 min
March 07, 2014

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Summary

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This protocol describes a microfabrication-compatible method for cell patterning on SiO2. A predefined parylene-C design is photolithographically printed on SiO2 wafers. Following incubation with serum (or other activation solution) cells adhere specifically to (and grow according to the conformity of) underlying parylene-C, whilst being repulsed by SiO2 regions.

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