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走査型電子顕微鏡による半導体材料における拡張欠陥の総合的な特性評価
JoVE Journal
Ingegneria
This content is Free Access.
JoVE Journal Ingegneria
Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope

走査型電子顕微鏡による半導体材料における拡張欠陥の総合的な特性評価

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11:14 min

May 28, 2016

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11:14 min
May 28, 2016

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Summary

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The optical, electrical, and structural properties of dislocations and of grain boundaries in semiconductor materials can be determined by experiments performed in a scanning electron microscope. Electron microscopy has been used to investigate cathodoluminescence, electron beam induced current, and diffraction of backscattered electrons.

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