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Micropunching Litografi for Generering Mikro-og submikrometer-mønstre på polymersubstrater
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Capítulos
- 00:05Título
- 01:05Cutting Operation in MPL: Overview and Initial Steps
- 01:57Cutting Operation in MPL: Single-layer Microstructures on a Substrate
- 02:36Cutting Operation in MPL: Multi-layer Microstructures on a Substrate
- 04:44Drawing Operation in MPL: Making PDMS Micropillars on HDPE Channel Sidewalls
- 06:25Microstructures Formed by Cutting and Drawing, and Their Application
- 09:00Conclusion
En micropunching litografi fremgangsmåde er udviklet til at frembringe mikro-og submikron-mønstre på toppen, sidevæggen og bundoverfladerne af polymer-substrater. Overvinder de forhindringer mønsterdannelse ledende polymerer og generere sidevæg mønstre. Denne metode giver mulighed for hurtig fremstilling af flere funktioner og er fri for aggressive kemi.
Tags
Micropunching LithographyGenerating Micro- And Submicron-patternsPolymer SubstratesConducting PolymersLithographic TechniquesTechnical ChallengesPhotolithographic MethodsWet EtchingDry EtchingMicro/nanosystemsPlanar FormSidewall Patterns3-D CircuitsFluidic ChannelsHorizontal Growth Of Nanowires And NanotubesMacropunching Method
