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Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
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JoVE Journal Ingenieurwesen
Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

DOI:
10.3791/54379-v

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08:38 min

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August 19, 2016

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, , , , , , , , , , , , , , , , ,
1Department of Materials Science and Engineering,Clemson University, 2Department of Materials Science and Engineering,Texas A&M University, 3Department of Electrical and Computer Engineering,Texas A&M University, 4College of Optics and Photonics, Center for Research and Education in Optics and Lasers (CREOL),University of Central Florida, 5Department of Materials Science and Engineering,Massachusetts Institute of Technology, 6Department of Mechanical Engineering,Virginia Polytechnic Institute, 7Microphotonics Center,Massachusetts Institute of Technology

Kapitel

  • 00:05Titel
  • 00:45Setting Up the Deposition Process
  • 01:48Electrospray Depostion of Chalcogenide Films
  • 02:58Characterization of Residual Solvent Removal of the Chalcogenide Films
  • 04:10Measurement of Chalcogenide Film Thickness
  • 06:50Results: Evaluation of Electrosprayed Film Properties
  • 07:58Conclusion

Summary

Automatische Übersetzung

Automatische Übersetzung

A method of uniform thickness solution-derived chalcogenide glass film deposition is demonstrated using computer numerical controlled motion of a single-nozzle electrospray.

Tags

Electrospray DepositionChalcogenide Glass FilmsMid-infrared Photonic ApplicationsFilm Thickness ProfileCompositional GradientChip-based Mid-infrared Chemical SensingTaylor ConeSerpentine PathLinear Thickness ProfileAnnealingFTIR Spectrum

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