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Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
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JoVE Journal 工学
Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

DOI:
10.3791/54379-v

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08:38 min

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August 19, 2016

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, , , , , , , , , , , , , , , , ,
1Department of Materials Science and Engineering,Clemson University, 2Department of Materials Science and Engineering,Texas A&M University, 3電気・コンピュータ工学科,Texas A&M University, 4College of Optics and Photonics, Center for Research and Education in Optics and Lasers (CREOL),University of Central Florida, 5Department of Materials Science and Engineering,Massachusetts Institute of Technology, 6機械工学科,Virginia Polytechnic Institute, 7Microphotonics Center,Massachusetts Institute of Technology

章

  • 00:05標題
  • 00:45Setting Up the Deposition Process
  • 01:48Electrospray Depostion of Chalcogenide Films
  • 02:58Characterization of Residual Solvent Removal of the Chalcogenide Films
  • 04:10Measurement of Chalcogenide Film Thickness
  • 06:50Results: Evaluation of Electrosprayed Film Properties
  • 07:58Conclusion

概要

自動翻訳

自動翻訳

A method of uniform thickness solution-derived chalcogenide glass film deposition is demonstrated using computer numerical controlled motion of a single-nozzle electrospray.

タグ

Electrospray DepositionChalcogenide Glass FilmsMid-infrared Photonic ApplicationsFilm Thickness ProfileCompositional GradientChip-based Mid-infrared Chemical SensingTaylor ConeSerpentine PathLinear Thickness ProfileAnnealingFTIR Spectrum

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