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Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films
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08:38 min
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August 19, 2016
DOI:
1Department of Materials Science and Engineering,Clemson University, 2Department of Materials Science and Engineering,Texas A&M University, 3電気・コンピュータ工学科,Texas A&M University, 4College of Optics and Photonics, Center for Research and Education in Optics and Lasers (CREOL),University of Central Florida, 5Department of Materials Science and Engineering,Massachusetts Institute of Technology, 6機械工学科,Virginia Polytechnic Institute, 7Microphotonics Center,Massachusetts Institute of Technology
概要
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A method of uniform thickness solution-derived chalcogenide glass film deposition is demonstrated using computer numerical controlled motion of a single-nozzle electrospray.
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Novak, S., Lin, P., Li, C., Borodinov, N., Han, Z., Monmeyran, C., Patel, N., Du, Q., Malinowski, M., Fathpour, S., Lumdee, C., Xu, C., Kik, P. G., Deng, W., Hu, J., Agarwal, A., Luzinov, I., Richardson, K. Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films. J. Vis. Exp. (114), e54379, doi:10.3791/54379 (2016).
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