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एक स्कैनिंग इलेक्ट्रॉन माइक्रोस्कोप से अर्धचालक पदार्थों में विस्तारित दोष का व्यापक विशेषता
JoVE 杂志
工程学
This content is Free Access.
JoVE 杂志 工程学
Comprehensive Characterization of Extended Defects in Semiconductor Materials by a Scanning Electron Microscope
DOI:

11:14 min

May 28, 2016

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Chapters

  • 00:05Title
  • 01:16Sample Preparation for Cryo-cathodoluminescence Experiment
  • 02:06Cryo-cathodoluminescence Experiment
  • 06:28Performing Cross-correlation Electron Backscatter Diffraction Experiments
  • 08:50Results: Cathodoluminenscence and Strain Fields of Extended Defects in Silicon
  • 10:19Conclusion

Summary

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The optical, electrical, and structural properties of dislocations and of grain boundaries in semiconductor materials can be determined by experiments performed in a scanning electron microscope. Electron microscopy has been used to investigate cathodoluminescence, electron beam induced current, and diffraction of backscattered electrons.

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