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U2O5 Film forberedelse via UO2 deponering av likestrøm Sputtering og påfølgende oksidering og reduksjon med atomisk oksygen og Atom Hydrogen
JoVE Journal
Chemistry
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JoVE Journal Chemistry
U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

U2O5 Film forberedelse via UO2 deponering av likestrøm Sputtering og påfølgende oksidering og reduksjon med atomisk oksygen og Atom Hydrogen

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12:05 min

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February 21, 2019

DOI:

10.3791/59017-v

DOI:
10.3791/59017-v

•

12:05 min
February 21, 2019

•

3 Views
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1European Commission, Joint Research Centre,Directorate for Nuclear Safety and Security

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Gouder, T., Huber, F., Eloirdi, R., Caciuffo, R. U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen. J. Vis. Exp. (144), e59017, doi:10.3791/59017 (2019).

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