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U2O5 Film forberedelse via UO2 Deposition af jævnstrøm Sputtering og Successive Oxidation og reduktion med atomare ilt og Atomic brint
JoVE Journal
Chemistry
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JoVE Journal Chemistry
U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

U2O5 Film forberedelse via UO2 Deposition af jævnstrøm Sputtering og Successive Oxidation og reduktion med atomare ilt og Atomic brint

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7,655 Views

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12:05 min

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February 21, 2019

DOI:

10.3791/59017-v

DOI:
10.3791/59017-v

•

12:05 min
February 21, 2019

•

3 Views
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1European Commission, Joint Research Centre,Directorate for Nuclear Safety and Security

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Gouder, T., Huber, F., Eloirdi, R., Caciuffo, R. U2O5 Film Preparation via UO2 Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen. J. Vis. Exp. (144), e59017, doi:10.3791/59017 (2019).

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