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利用uo2_沉积制备 u2o5 薄膜, 利用原子氧和原子氢连续氧化还原

JoVE Journal
Chemistry

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JoVE Journal Chemistry

U₂O₅ Film Preparation via UO₂Deposition by Direct Current Sputtering and Successive Oxidation and Reduction with Atomic Oxygen and Atomic Hydrogen

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利用uo2_沉积制备 u2o5 薄膜, 利用原子氧和原子氢连续氧化还原

7,655 Views

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12:05 min

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February 21, 2019

DOI:

10.3791/59017-v

DOI:

10.3791/59017-v

•

12:05 min

February 21, 2019

•

3 Views

Thomas Gouder, Frank Huber, Rachel Eloirdi, Roberto Caciuffo

¹European Commission, Joint Research Centre,Directorate for Nuclear Safety and Security

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