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高周波マグネトロンスパッタ リングによる GdBa2Cu3O7−δ/チタン酸ストロンチウム3 (STO) 単結晶基板上 La0.67Sr0.33MnO3準二層フィルム
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April 12, 2019
DOI:
1Department of Physics, Mathematics, Shanghai Key Laboratory of Materials Protection and Advanced Materials in Electric Power,Shanghai University of Electric Power, 2Key Laboratory of Artificial Structure and Quantum Control, Ministry of Education, Department of Physics,Shanghai Jiao Tong University, 3Shanghai Institute of Space Power-sources, 4Shanghai Key Laboratory of High Temperature Superconductors,Shanghai University
Summary
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ここでは、LSMO ナノ粒子を成長するためのプロトコルを提案する、無線周波数 (RF) による単結晶基板 (001) チタン酸ストロンチウム3 (STO) (Gd) BCO 膜のスパッタします。
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Wang, Y., Li, Z., Liu, Y., Li, Y., Liu, L., Xu, D., Luo, X., Gao, T., Zhu, Y., Zhou, L., Xu, J. Radio Frequency Magnetron Sputtering of GdBa2Cu3O7−δ/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 (STO) Single-crystal Substrates. J. Vis. Exp. (146), e58069, doi:10.3791/58069 (2019).
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