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Epitel nanostruktureret α-kvartsfilm på silicium: Fra materialet til nye enheder
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Capítulos
- 00:05Introduction
- 00:54Preparation of PDMS Templates and Gel Film Deposition on SOI Substrates by Dip-Coating
- 02:55Surface Micro/Nanostructuration by Soft Imprint Lithography and Gel Film Crystallization by Thermal Treatment
- 04:00Preparing and Patterning of the Quartz Samples for the Cantilever Microfabrication Process
- 08:49Results: Qualitative Analysis of the Progressive Epitaxial Nanostructured α-Quartz Film Thickness Developed on Silicon
- 10:20Conclusion
Dette arbejde præsenterer en detaljeret protokol for mikrofabrikation af nanostruktureret α-kvarts cantilever på en Silicon-On-Insulator (SOI) teknologi substrat startende fra den epitaxiale vækst af kvarts film med dip belægning metode og derefter nanostrukturering af den tynde film via nanoimprint litografi.
Tags
EpitaxialNanostructuredAlpha-quartzSiliconQuartz-based SensorsMiniaturizationMonolithic IntegrationChemical IntegrationEpitaxial RequirementsMicrocantileversActive Microelectromechanical SystemLead-free Piezoelectric Oxide MaterialsMass SensitivityPDMSSOI SubstrateDip CoatingGel FilmMicro/nanostructure
