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Ansammlung und die Analyse der geladene Ionen in eine Kupfersulfat Plating-Lösung

JoVE Journal
Química

This content is Free Access.

JoVE Journal Química

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

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Ansammlung und die Analyse der geladene Ionen in eine Kupfersulfat Plating-Lösung

14,296 Views

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07:00 min

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March 20, 2019

DOI:

10.3791/59376-v

DOI:

10.3791/59376-v

•

07:00 min

March 20, 2019

•

9 Views

Toshiaki Koga, Yoshitaro Sakata, Nao Terasaki

¹Advanced Manufacturing Research Institute, Department of Electronics and Manufacturing,National Institute of Advanced Industrial Science and Technology (AIST)

Tags

Copper Sulfate Plating Solution Monovalent Copper Quantification Optical Evaluation Nitrogen Gas Copper Plate Platinum Plate Power Supply UV-Vis Spectrophotometer

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