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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution
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Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution

14,451 Views

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07:00 min

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March 20, 2019

DOI:

10.3791/59376-v

DOI:
10.3791/59376-v

•

07:00 min
March 20, 2019

•

12 Views
, ,
1Advanced Manufacturing Research Institute, Department of Electronics and Manufacturing,National Institute of Advanced Industrial Science and Technology (AIST)

概要

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Here, accumulation of cuprous ions in a copper sulfate plating solution in a model experiment and an analysis based on quantitative measurements are described. This experiment reproduces the accumulation process of cuprous ions in the plating bath.

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Cite this Article

Koga, T., Sakata, Y., Terasaki, N. Accumulation and Analysis of Cuprous Ions in a Copper Sulfate Plating Solution. J. Vis. Exp. (145), e59376, doi:10.3791/59376 (2019).

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